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X射线光刻技术是当前制作亚微米工艺结构大规模集成电路的关键技术之一,倍受重视。在实用化的X光刻机的研究探索和技术开发中,强功率高电流密度电子枪的设计是其中重要的课题之一。本文介绍作为X光光源用的环状阴极电子枪的通用计算机程序,这一程序可供计算多电极系统任意电极形状的束流控制特性、电子束着靶轨迹及电流密度分布等。文中给出一些典型计算实例,这将有助于这类仪器设备的设计与改进。由于这种高功率环状阴极电子枪具备一系列优点,同样可推广应用于电子束熔炼、电子束蒸发等装置中。
X-ray lithography is one of the key technologies in the fabrication of large-scale integrated circuits for sub-micron process structures. In the practical X-ray machine research and exploration and technology development, the design of high power and high current density electron gun is one of the important issues. This article presents a general-purpose computer program for a ring cathode gun for X-ray light sources. This program is used to calculate the beam control characteristics of any electrode shape for a multi-electrode system, the trajectory of the electron beam and the current density distribution. The article gives some typical calculation examples, which will help the design and improvement of such equipment. As a result of this series of high-power annular cathode electron gun has the advantages of the same can be widely used in electron beam melting, electron beam evaporation and other devices.