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用同步辐射光源进行大规模集成电路和微器件光刻是现阶段的一项高新技术。本文介绍同步辐射光刻的镜扫描控制系统。它的设计思想，所采用的方法以及最优控制等都具有科技应用和经济价值。
Synchrotron radiation light source for large-scale integrated circuits and micro-lithography is a high-tech at this stage. This article describes synchrotron radiation mirror scanning control system. Its design philosophy, methods used, and optimal control all have technological applications and economic value.