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提出了制备氧化铟锡薄膜（ＩＴＯ）的磁控反应溅射镀膜设备的关键部件的设计原则。给出了该设备的调试结果。
The design principle of the key components of magnetron reactive sputter coating equipment for preparing indium tin oxide film (ITO) was proposed. The result of the commissioning of the device is given.