提出了一种基于准分子激光制备45°微反射镜的新方法──激光阶梯刻蚀法,介绍了该方法的工艺流程。通过优化参数制备了微反射镜样品,详细分析了样品参数对微镜反射性能的影响。利用微反射镜样品进行垂直耦合实验,深入讨论了影响系统损耗的主要因素。实验结果表明,微反射镜样品造成的损耗约为3.5dB。该制备方法有望在大尺寸光波导互连背板耦合器件的研制中得到广泛应用。 A new method based on excimer laser to prepare 45 ° micro-mirror ─ ─ laser step etching method, introduced the process flow of this method. The micromirror samples were prepared by optimizing the parameters, and the influence of sample parameters on the micromirror reflection properties was analyzed in detail. Micro-mirror samples were used for vertical coupling experiments, and the main factors affecting the system loss were discussed in depth. Experimental results show that the micromirror sample loss caused by about 3.5dB. The preparation method is expected to be widely used in the research and development of large-size optical waveguide interconnection backplane coupling devices.