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通过对制备工艺的摸索 ,制备出用于软X光激光实验的In衰减膜 ;利用α能谱测厚仪对In衰减膜的质量厚度进行了测量 ;通过俄歇电子谱并结合Ar离子刻蚀对In膜表面氧化及氧元素质量分数的深度分布进行了分析 .
Through the exploration of the preparation process, the In film was prepared for the soft X-ray laser experiment. The thickness of the In film was measured by α-spectrum thickness gauge. By Auger electron spectroscopy and Ar ion etching The depth of oxidation of the In film surface and the mass fraction of oxygen were analyzed.