论文部分内容阅读
随着MEMS和MOEMS技术的发展和器件制作对低成本、灵活、高效的需求,数字灰度无掩模光刻技术已成为人们研究的热点。介绍了一种基于数字微镜器件(DMD)的无掩模数字灰度投影光刻技术,结合电寻址数字微镜阵列的工作方式,分析了DMD的灰度调制机理和投影成像特性;阐述了DMD微镜结构与投影系统的倍数、数值孔径的关系;设计了投影光刻系统,并进行了分辨力和三维面形的曝光实验。实验结果表明,数字灰度投影光刻技术灵活、方便,尤其在三维浮雕微结构的制作方面,可实现光刻灰度的数字化调制,表面粗糙度可达0.1μm。
With the development of MEMS and MOEMS technology and the demand for low cost, flexible and efficient device fabrication, digital gray scale maskless lithography has become a hot research topic. A maskless digital grayscale projection lithography technology based on digital micromirror device (DMD) is introduced. Combining with the operation of EDM digital micromirror array, the gray modulation mechanism and projection imaging characteristics of DMD are analyzed. The relationship between the DMD micromirror structure and the magnification and numerical aperture of the projection system was designed. The projection lithography system was designed and the experiments of resolution and three-dimensional profile exposure were carried out. The experimental results show that the digital grayscale projection lithography is flexible and convenient. Especially in the fabrication of 3D relief microstructure, the digital modulation of lithography grayscale can be realized with the surface roughness up to 0.1μm.