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一、引言: 用化学气相沉积(CVD)法在硬质合金和钢的基体表面上形成由碳化物、氮化物和氧化物所构成的高耐磨、抗腐蚀的涂层,通常是用H_2、N_2、CO_2以及金属氯化物、有机化合物的蒸汽,在1000℃左右的高温条件下,进行化学气相反应(高温CVD)的结果。最近又开发了700～900℃温度下生产碳氮化钛涂层的工艺,即中温CVD(MT CVD)工艺。在实际工业生产中,涂层工艺是用专用设备实现的。它主要包括一个热壁反应器,并带有必要的辅助设备,以保证有效地控制沉积温度、各种原料气的供应量及沉积室气体压力等气相反应参数。
I. INTRODUCTION: High wear-resistant and corrosion-resistant coatings composed of carbides, nitrides and oxides are formed on the substrate surfaces of cemented carbide and steel by chemical vapor deposition (CVD), usually using H 2, N 2, CO 2, and metal chlorides and organic compounds. The chemical vapor phase reaction (high temperature CVD) is carried out at a high temperature of about 1000 ° C. Recently, a process of producing a titanium carbonitride coating at a temperature of 700-900 ° C has been developed, that is, a medium temperature CVD (MT CVD) process. In actual industrial production, the coating process is carried out using special equipment. It mainly consists of a hot wall reactor with the necessary auxiliary equipment to ensure effective control of deposition temperature, supply of various feed gases and gas phase reaction parameters such as gas pressure in the deposition chamber.