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我们采用BCl_3+Cl_2混合气体在PT520/540设备上对Al/Ti膜进行一次性连续反应离子腐蚀,克服了湿法腐蚀Ai/Ti和先湿法腐蚀Al后用圆筒型等离子体腐蚀Ti的所有弊病,从而根本性地解决了Al/Ti全属化的腐蚀问题。
We use BCl_3 + Cl_2 mixed gas on the PT / 520/540 device on the Al / Ti film continuous one-time reactive ion etching, to overcome the wet etching Ai / Ti and wet etching of Al after the cylinder plasma etching Ti All the ills, so as to fundamentally solve the Al / Ti all-metal corrosion problems.