目前大部分x射线源使用旋转水冷靶,但旋转靶会引起振动,使引出束晃动,降低了分辨率,振动也会使片子移动,产生对准误差。固定靶避免了这些问题,但用固定靶得到足够高的功率是很难的。 Kevex公司最近设计并生产了用于半导体片子曝光系统的新的固定靶x射线源。在工作中,电子流聚焦在一个3mm直径的固定靶上,在高压下用超纯水打到阳极靶上进行水冷,用高压防止形成一个蒸气屏障,使热迅速除去。壳体为阴极,具有地电位,因此壳体不需要电 Most current x-ray sources use a rotating water-cooled target, but the rotating target causes vibration, causing the lead beam to wobble, reducing resolution, and vibrations also causing the film to move, creating alignment errors. Fixed targets avoid these problems, but it is difficult to get a sufficiently high power with a fixed target. Kevex recently designed and manufactured a new fixed-target x-ray source for semiconductor film exposure systems. In operation, the electron flow is focused on a 3 mm diameter fixed target, water is applied to the anode target under high pressure with ultrapure water, and high pressure is used to prevent the formation of a vapor barrier that rapidly removes the heat. The shell is a cathode with a ground potential so the shell does not need electricity