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通过自动极图衍射测量与极图分析研究空心阴极离子镀TiN膜晶粒取向,结果表明,TiN膜存在(111)织构,(111)晶面平行于沉积表面,研究了负偏压对TiN晶粒取向的影响,负偏压在0～200V范围内变化不改变织构类型与取向。
The crystal orientation of the hollow cathode ion-plating TiN film was studied by means of the auto-polar diagram diffraction measurement and pole figure analysis. The results show that the TiN film has (111) texture and the (111) crystal plane is parallel to the deposition surface. Grain orientation, negative bias changes in the range of 0 ~ 200V does not change the texture type and orientation.