利用射频等离子体增强化学气相沉积 (RFPECVD)工艺在常温下实现在不锈钢、硅片、玻璃等基底上大面积沉积类金刚石 (DL C)膜。薄膜表面光滑致密 ,与衬底的结合力较高。用 Raman,FTIR,SEM,EDX研究了薄膜的形貌、结构与组分。用栓 -盘摩擦磨损试验机测试了薄膜的摩擦系数。通过优化沉积参数 ,所沉积的DL C膜在与 10 0 Cr6钢球对磨时摩擦系数低于 0 .0 1。在摩擦过程中 DL C膜的磨损机制借助 SEM进行了研究 Large area deposition of diamond-like carbon (DL C) films on stainless steel, silicon wafers, glass substrates, etc. at room temperature using RFPECVD processes. The surface of the film is smooth and dense, and the binding force with the substrate is high. The morphology, structure and composition of the films were investigated by Raman, FTIR, SEM and EDX. The coefficient of friction of the film was tested using a plug-plate friction and wear tester. By optimizing the deposition parameters, the deposited DL C film has a friction coefficient of less than 0.01 when it is ground with 10 0 Cr6 steel balls. The wear mechanism of DL C film during the rubbing process was investigated by SEM