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提出了一种新颖的阴极微弧电沉积技术（CMED）.利用该技术在FeCrAl合金上制备出厚的钇稳定氧化锆（YSZ）涂层.研究结果表明,在试样上预先沉积YSZ薄膜,施加高压电脉冲时可以导致微弧放电;在微弧的作用下可以获得厚度达 300μm具有晶态结构的 YSZ涂层;高压电脉冲的电压值和频率决定了沉积涂层的厚度;电解液中添加硝酸钇时,发生ZrO2和Y2O3的共沉积,可使涂层中的t-ZrO2,t’-ZrO2和c-ZrO2稳定到室温;提高电解液中Y（NO3）3的含量可以降低涂层中m-ZrO2的相对含量.研究了阴极微弧电沉积YSZ涂层的微观结构,分析了阴极微弧电沉积的基本过程及机理.
A novel cathode micro-arc electroless deposition (CMED) technique was proposed, in which a thick yttrium-stabilized zirconia (YSZ) coating was prepared on FeCrAl alloy.The results showed that YSZ thin films were pre-deposited on the samples, When high voltage pulse is applied, it can cause micro-arc discharge. YSZ coating with thickness of 300μm can be obtained by micro-arc. The voltage and frequency of high voltage pulse determine the thickness of deposited coating. When yttrium nitrate is added to the solution, co-deposition of ZrO2 and Y2O3 occurs, stabilizing t-ZrO2, t’-ZrO2 and c-ZrO2 in the coating to room temperature, and increasing the content of Y (NO3) 3 in the electrolyte The relative content of m-ZrO2 in the coating.The microstructure of the YSZ coating deposited on the cathode was studied and the basic process and mechanism of the cathode micro-arc electrodeposition were analyzed.