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用小波幅周期伏安测量法,分析浸入pH值为9.2的无黄药和含黄药硼酸盐溶液中的铜的氧化表面研究电化学位对铜和黄铜矿颗粒可浮性的影响。研究表明,黄原酸铜类物质的生成,不仅与铜和黄药离子之间的直接反应有关,而且也与黄药离子和与黄铜矿之间的直接反应有关。由资料得知,导致铜和黄铜矿颗粒疏水的物质是黄原酸铜类物质和双黄药。在微量浮选-电化学槽和丹佛型电化学槽中进行的浮选试验证明,当铜和黄铜矿表面上存在这两种物质时,可获得最大的可浮性。为了分析产生疏水性物质的稳定性,进行了电位降的测量。
The effect of electrochemical sites on the buoyancy of copper and chalcopyrite particles was investigated by the cyclic voltammetry with small amplitude and the oxidation surface of copper immersed in non-xanthate and xanthate containing borate at pH 9.2. Studies have shown that the generation of copper xanthate species is not only related to the direct reaction between copper and xanthate ions but also to the direct reaction between xanthate ions and chalcopyrite. From the information that lead to copper and chalcopyrite particles hydrophobic material is xanthate copper material and double xanthate. Flotation tests conducted in the micro-flotation-electrochemical cell and in the Denver-type electrochemical cell demonstrate the maximum floatability available when both are present on the surface of copper and chalcopyrite. In order to analyze the stability of the resulting hydrophobic material, a potential drop was measured.