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设计了一种新的具有高曝光深度的纳米光刻直写头,它由用薄银层制得的V型孔、匹配液和有机固化层组成。V型孔被用来聚焦入射光束于200 nm的光斑中。直写头通过匹配液在光刻胶上移动,而匹配液与石英基底相结合,构成了表面等离激元(SPP)谐振腔,由传播波及反射波形成的驻波的传播深度将达到几百纳米。模拟证明了新的直写头可通过F-P效应及SPP多次激发增强方式实现在光刻胶中深度曝光,当直写头与光刻胶的间距大于90 nm时,不仅可避免光刻胶和直写头的相对磨损,也有助于降低机械移动工艺的要求,因此在纳米掩模板和纳米光子器件的制备上有较高实际应用的可能性。
A new nano-lithography write head with high exposure depth is designed, which consists of a V-shaped hole made of a thin silver layer, a matching liquid and an organic solidified layer. V-shaped holes are used to focus the incident light beam at 200 nm spot. The write head moves through the resist on the photoresist and the matching liquid combines with the quartz substrate to form a surface plasmon polariton (SPP) resonator. The propagation depth of the standing wave formed by the propagating wave and the reflected wave will reach a few One hundred nanometers. Simulation shows that the new write head can realize deep exposure in the photoresist through the FP effect and SPP multiple excitation enhancement mode. When the distance between the write head and the photoresist is greater than 90 nm, the photoresist and the straight The relative wear of the writing head also helps to reduce the requirements of the mechanical moving process and therefore has the potential for practical application in the preparation of nano-reticle and nanophotonic devices.