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我们用GD-450B高真空多层镀膜机制备碳膜,蒸发支架如图1所示。蒸发前,靠支架上的弹簧,使可滑动的一根碳棒的尖端与另一根被固定的碳棒的斜面接触;当点弧后断弧时,可在真空室外操纵手动接触棒,使它碰撞碳棒末端铜套,引起多次接触电弧。在10~(-5)mmHg的真空室中,用这样二对支架,在不破坏真空的情况下,使用0～150A的断续弧流,在半小时左右,可蒸发到80～100μg/cm~2厚的碳膜,甚至更厚些。蒸发源与工件的距离为
We use GD-450B high vacuum multi-layer coating machine to prepare carbon film, evaporation stent shown in Figure 1. Before evaporation, the spring on the supporter makes the tip of a slidable carbon rod contact with the bevel of the other fixed carbon rod. When the arc is broken and the arc is broken, the manual contact rod can be manipulated outside the vacuum chamber to make It collides with the end of the carbon rod copper sleeve, causing multiple contacts arc. In a vacuum chamber of 10 ~ (-5) mmHg, using such two pairs of supports, a discontinuous arc current of 0-150 A can be used without breaking the vacuum and can evaporate to 80-100 μg / cm in about half an hour ~ 2 thick carbon film, even thicker. The distance between the evaporation source and the workpiece is