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一、金属离子注入概况 离子注入技术已成功地应用于微电子技术,促进了微电子技术的发展。在金属及非金属的改性方面也已显露了它的独特优点,已日益引起人们的重视和研究。金属离子注入最重要的特点是用离于注入的方法,在金属或非金属表面注入一薄层其它的元素,就可以大大地提高原基体材料的表面的硬度、耐磨性、抗腐蚀性及抗疲劳强度,而并不改变基体材料的本来性能。这一点在机械、化工、航空等工业部门是极为有用的。 离子注入方法,只能在基体材料表面形成很薄的一层注入层,在200Kev的注入能量下,注入层大约只有0.5mm,但由于这
First, the overview of metal ion implantation Ion implantation technology has been successfully applied to microelectronics technology, and promote the development of microelectronics technology. Its unique advantages have also been revealed in the modification of metals and non-metals, which have drawn increasing attention and research. The most important feature of metal ion implantation is the injection of a thin layer of other elements on the surface of the metal or non-metal, which can greatly improve the surface hardness, wear resistance, corrosion resistance and Fatigue strength, without changing the original properties of the matrix material. This is extremely useful in the industrial sectors such as machinery, chemicals and aviation. The ion implantation method can only form a thin layer of injection layer on the surface of the base material. At an implantation energy of 200 KeV, the injection layer is only about 0.5 mm, but due to this