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研究了用直流磁控溅射技术在 80～ 1 40目的镍基合金微粒表面包覆 1 0μm左右的金属铬膜的方法 ,讨论了工艺的影响和膜的性能 ,指出利用直流磁控溅射技术可在镍基合金微粒表面获得均匀、完整的厚铬膜 ,微粒的预处理和后处理对膜的附着性有重要影响
The method of DC magnetron sputtering was used to coat the surface of nickel-based alloy particles with the size of 80-140 mesh with about 10μm chromium film. The influence of the process and the properties of the film were discussed. It was pointed out that the DC magnetron sputtering A uniform and complete thick chromium film can be obtained on the surface of Ni-based alloy particles. The pretreatment and post-treatment of particles have an important influence on the adhesion of the film