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Dielectric barrier discharge at atmospheric presure has been applied to prepare hydrocarbon films on large- area glass and silicon substrates. When hydrogen and methane mixture(2:1) is used as discharge gas and the substrate is heated to 300 C, hard hydrogenated amorphous carbon film is deposited. From the IR deconvolution analysis of the C-H stretching absorption for the coating, the hydrocarbon group ration (CH3:CH2:CH) and C-C bond type ratio (sp3c/sp2c) are about 10%: 21%: 69% and 3:1~6:1,respectively. Their Knoop hardness is up to 10Gpa. No film isdeposited when the content of methane in the mixed gases is decreased to 5% at 300 C silicon substrate.
Dielectric barrier discharge at atmospheric presure has been applied to prepare hydrocarbon films on large-area glass and silicon substrates. When hydrogen and methane mixtures (2: 1) are used as discharge gas and the substrate is heated to 300 C From the IR deconvolution analysis of the CH stretching absorption for the coating, the hydrocarbon group ration (CH3: CH2: CH) and CC bond type ratio (sp3c / sp2c) are about 10%: 21%: 69% and 3: 1 ~ 6: 1, respectively. Their Knoop hardness is up to 10Gpa. No film isdeposited when the content of methane in the mixed gases is decreased to 5% at 300C silicon substrate.