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本文是作为微图像技术有限公司和电子技术信息实验室的微电子学实验室的协作结果而写出。文中对微电路制造中所用化学溶液的分析技术和初步分析结果作了介绍。对两种性质不同的分析问题进行了研究;首先对含有可溶和不可溶杂质的溶液分析作了介绍,而后介绍了用超过滤技术过滤到0.2微米的溶液中分离出颗粒杂质的分析。结果指出,在半导体级化学试剂中有大量的不可溶金属杂质,但是采用超过滤技术可以除掉这些杂质。
This article was written as a collaborative effort between Microelectronics Technologies Co., Ltd. and the Microelectronics Laboratory of the Electronic Technology Information Laboratory. In this paper, the analysis of the chemical solution used in the manufacture of microcircuitry and the preliminary analysis results are introduced. Two analytical problems of different nature were studied. Firstly, the solution analysis of soluble and insoluble impurities was introduced. Then, the analysis of the separation of particulate impurities by ultrafiltration into 0.2 micron solution was introduced. The results indicate that there is a large amount of insoluble metal impurities in semiconductor-grade chemicals, but these impurities can be removed by ultrafiltration.