在不同的溅射功率和溅射时间下,使用磁控溅射设备制备了系列薄膜Si/Fe(P1w,T1s)和Si/[Fe(P2w,T2s)/NiO(P3w,T3s)]10。利用小角X射线衍射测量了样品的衍射强度分布,并分别计算出了Fe和NiO在不同溅射功率下的沉积速率。实验结果表明,在测量范围内沉积速率与溅射功率之间存在线性关系。 A series of thin film Si / Fe (P1w, T1s) and Si / [Fe (P2w, T2s) / NiO (P3w, T3s)] 10 were prepared by magnetron sputtering at different sputtering powers and sputtering times. The diffraction intensity distribution of the samples was measured by small-angle X-ray diffraction and the deposition rates of Fe and NiO at different sputtering powers were calculated. The experimental results show that there is a linear relationship between the deposition rate and sputtering power in the measurement range.