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由磁控溅射方法制得的多层TiC/TiB_2,在沉积过程中采用了不同程度的离子轰击,在以前的研究中,考虑到裂纹扩展阻力及磨损特性,特别在间歇切削条件下,5μm厚的整个涂层产生最佳性能的单层数目大约100～200,有迹象表明,界面区域阻碍裂纹,基体不加偏压溅射后,这些区域大约有2～3nm的扩展带,在沉积过程中,离子轰击导致相似的界面区域,改变了涂层组织,并且特别在多层涂层的情况下可以得到最好的涂层性能,对5μm厚涂层,要获得最佳性能及耐磨性大约需500单层,本文研究组织结构、性能与工艺参数间的关系。
The multi-layer TiC / TiB_2 obtained by magnetron sputtering method used different degrees of ion bombardment in the deposition process. In the previous study, taking into account the crack propagation resistance and wear characteristics, especially under intermittent cutting conditions, 5μm The number of monolayers providing the best overall performance for the thicker coating is about 100-200. There are indications that the interfacial region hinders cracking and that these regions have an extension band of about 2 to 3 nm after unbiased sputtering of the substrate. During the deposition process , Ion bombardment results in a similar interfacial area, changes in the coating texture, and gives the best coating performance especially in the case of a multi-layer coating, for optimum performance and abrasion resistance for a 5 [mu] m thick coating About 500 monolayers are required, this paper studies the relationship between organizational structure, performance and process parameters.