【摘 要】
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A nano-crystalline diamond (NCD) film with a smooth surface was successfully deposited on silicon by a hot filament chemical vapor deposition (HFCVD) method. Sc
【机 构】
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School of Materials Science and Engineering,Physics Department
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A nano-crystalline diamond (NCD) film with a smooth surface was successfully deposited on silicon by a hot filament chemical vapor deposition (HFCVD) method. Scanning electron microscopy (SEM),atomic force microscopy (AFM),RAMAN scattering spectra,as well as spectroscopic ellipsometry were employed to characterize the as-grown film. By fitting the spectroscopic ellipsometric data in the energy range of 0.75-1.50 eV with a three-layer model,Si|diamond+non-diamond|diamond+non-diamond+void|air,the optical constants are obtained. The refractive index of the NCD film varies little from 2.361 to 2.366 and the extinction coefficient is of the order of 10-2. According to the optical transmittance and absorption coefficient in the wavelength range from 200 to 1 100 nm,the optical gap of the film is estimated to be 4.3 eV by a direct optical transition mechanics.
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