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采用室温磁控溅射技术在超细晶TiNi合金表面制备出CNx/SiC(氮化碳/碳化硅)双层薄膜,SiC为中间层。研究了CNx薄膜的组织结构、纳米压痕和摩擦性能。结果表明:CNx薄膜存在微孔缺陷(基体中夹杂物脱落等原因引起)、石墨含量高、纳米硬度(5.23GPa)低、弹性模量(33.29GPa)低,但具有高的硬度与弹性模量比值(0.157)。在200g载荷、氮化硅球(半径为2mm)为对摩件、大气干摩擦条件下,CNx薄膜的摩擦系数约为0.173,磨损后薄膜未出现裂纹和剥落;在500g载荷、室温Kokubo人体模拟体液下,CNx薄膜的摩擦系数约为0.103,但磨损后薄膜出现剥落。剥落的发生可能是由于SBF溶液通过微孔缺陷进入并腐蚀薄膜-薄膜-基材界面所致。
A CNx / SiC bilayer film was prepared on the surface of ultrafine TiNi alloy by magnetron sputtering at room temperature. SiC was the middle layer. The structure, nanoindentation and friction properties of CNx films were studied. The results show that CNx thin films have micropore defects (inclusions detach in the matrix), high graphite content, low nanohardness (5.23 GPa) and low elastic modulus (33.29 GPa), but have high hardness and elastic modulus Ratio (0.157). The friction coefficient of CNx film is about 0.173 under 200g load and silicon nitride sphere (radius is 2mm), and no cracks and spalling are observed on the film after abrasion. Under the load of 500g, room temperature Kokubo human body simulation Under body fluids, the CNx film has a coefficient of friction of about 0.103, but the film peeled off after abrasion. Spalling can occur as a result of the SBF solution entering the microporous defect and etching the film-film-substrate interface.