光曝光技术的极限是0.5μm,人们期待着X射线曝光技术作为可以描画0.5μm以下图形的下一代技术。最近X射线曝光技术进展明显,听到有这样的看法:不一定要等待图形线宽小到0.5μm,只要进入1μm以下的亚微米时代,也就可以开始使用X射线曝光技术了。至今为止,研制和出售X射线曝光装置的厂家只有美国的Micronix公司一家。但是,以生产集成电路的厂家和制造光曝光装置的厂家为中心进行的X射线曝光机研制 The limit of light exposure technology is 0.5 μm, and X-ray exposure technology is expected as a next generation technology that can draw a figure of 0.5 μm or less. The recent progress of X-ray exposure has been marked by the notion that it is not necessary to wait for the linewidth of the pattern to be as small as 0.5 μm and to start using X-ray exposure just by entering the submicron era below 1 μm. Until now, only Micronix companies in the United States have been developing and selling X-ray exposure devices. However, the development of X-ray exposure machines focusing on manufacturers of integrated circuits and manufacturers of light exposure devices