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采用直流辉光放电辅助脉冲激光沉积(PLD)法,以不同的激光通量在单晶硅基底上沉积CNx薄膜。利用扫描电镜(SEM)、拉曼光谱、X射线衍射(XRD)谱、X射线光电子谱(XPS)、纳米压入仪和球盘式微型摩擦磨损试验仪对薄膜的成分、微观结构、表面形貌、力学及摩擦学性能进行了系统分析。结果表明:所有薄膜处于非晶状态。当激光通量从5.1J/cm2提升至7.5J/cm2时,薄膜的含氮原子数分数由27.7%上升至34.1%;膜中sp3 C—N键和sp2 C—N键的面积百分数上升,sp3 C—C键的面积百分数降低,C原子sp3杂化程度增加,薄膜的石墨化程度下降;薄膜的硬度由3.7GPa增加至5.3GPa,磨损率从3.8×10-13 m3/(N·m)下降至7.9×10-14 m3/(N·m),摩擦系数从0.13上升至0.18。
A DC glow discharge assisted pulsed laser deposition (PLD) method was used to deposit CNx thin films on monocrystalline silicon substrates with different laser fluxes. The composition, microstructure, surface morphology of the films were characterized by scanning electron microscopy (SEM), Raman spectroscopy, X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), nanoindentation and ball- Physical, mechanical and tribological properties of a systematic analysis. The results show that all films are in an amorphous state. When the laser flux increased from 5.1J / cm2 to 7.5J / cm2, the atomic fraction of nitrogen increased from 27.7% to 34.1%; the area percentage of sp3 C-N bond and sp2 C-N bond in the film increased, the area percentage of sp3 C-C bonds decreased, the degree of sp3 hybridization increased and the graphitization degree decreased. The hardness increased from 3.7 GPa to 5.3 GPa, and the wear rate increased from 3.8 × 10-13 m3 / (N · m ) To 7.9 × 10-14 m3 / (N · m), the friction coefficient increased from 0.13 to 0.18.