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利用X-射线衍射,XPS和AES技术深入地研究了退火气氛中氧对Pt硅化物薄膜的固相成分的影响,发现痕量氧引起硅和铂(Pt)的不完全反应.为了形成单相的PtSi膜,在退火过程中防止氧的沾污是非常重要的.
The effect of oxygen on the solid phase composition of the Pt silicide film was investigated in detail by X-ray diffraction, XPS and AES techniques. Trace oxygen was found to cause incomplete reaction between silicon and platinum (Pt) PtSi film, in the annealing process to prevent the contamination of oxygen is very important.