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近年来,随着技术的发展,在半导体大规模集成电路、磁泡、光集成电路及表面波器件等多种器件领域,亚微米加工技术已成为提高器件特性的有效手段。作为最适用的装置是由扫描型电子显微镜发展起来的电子束扫描装置。现在,国内外对电子束扫描装置都在着力研究,其成果将陆续有报导。但是,由于扫描很费时间(≥数十小时/片),目前还不能用电子扫描装置直接扫描大量的片子,它的作用还只限于制备掩模图形。对于由电子束扫描装置制备出的高精度掩模图形,为使其能在较短时间内在片子上曝光而不致降低精度,这就需要一种新的
In recent years, with the development of technology, submicron processing technology has become an effective means to improve the device characteristics in a variety of devices such as semiconductor LSI, bubble, optical integrated circuits and surface wave devices. As the most suitable device is a scanning electron microscope developed electron beam scanning device. Now, at home and abroad on the electron beam scanning device are hard to study, the results will be reported one after another. However, it has not been possible to directly scan a large number of films with an electronic scanning device at present due to the time-consuming scanning (≥ tens of hours / piece), and its effect is limited to the preparation of mask patterns. For the high-precision mask pattern prepared by the electron beam scanning device, in order to enable it to be exposed on the film in a short period of time without degrading the accuracy, a new