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近来尼龙过滤被广泛用于光刻工艺流程来改善良率,因为许多IC和光阻制造商有实验性证据表明尼龙滤膜能吸附杂质。然而,尼龙滤膜降低缺陷的机制尚不清楚。通过致力于特定的光阻成分来研究不同的缺陷发生机制是十分有用的。利用表面改性和不同的光阻成分进行了各种吸附试验来测量尼龙滤膜的耐受性,包括表面张力,光酸发生剂和光酸抑制剂。最后,研究希望通过致力于如何最佳贯彻尼龙过滤策略来确定最有效的方法提高良率。
Nylon filtration has recently been widely used in photolithographic processes to improve yield, as many IC and photoresist manufacturers have experimental evidence that nylon filters adsorb impurities. However, the mechanism by which nylon filters reduce defects is not clear. It is useful to study different mechanisms of defect formation by focusing on specific photoresist components. Various adsorption tests were performed using surface modification and different resist compositions to measure the resistance of nylon membranes, including surface tension, photoacid generators and photoacid inhibitors. Finally, the study hopes to identify the most effective ways to improve yield by focusing on how best to implement nylon filtering strategies.