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各向异性,选择性的腐蚀特点以及损伤(包括本征键损伤、杂质及腐蚀离子注入衬底表面)是评价干腐蚀的重要方面。这不仅与所选反应系统模式有关,也受所用反应气和工作气压影响甚大。如CC1F_3和CC1_2F_2等含氯卤碳化合物,具有高的各向异性腐蚀和好的选择性,因“氯”只有在具备离子轰击条件下腐蚀速度才快,而含氟的化合物,因“氟”的腐蚀不需要离子轰击,容易是各向同性的,SF_6是不含碳的腐蚀气,不会生成多聚物,且对硅的腐蚀速率较快,并有较好的Si/SiO_2腐蚀选择性,但不少文献报导其各向异性的腐蚀特性差。最近,R.Pinto 等人对SF_6的反应离子腐蚀进行了研究。
Anisotropic, selective etching features as well as damage (including intrinsic bond damage, impurity and corrosive ion implantation into the substrate surface) are important aspects for evaluating dry etching. This is not only related to the mode of the chosen reaction system, but also greatly affected by the reaction gas and working pressure used. Such as CC1F_3 and CC1_2F_2 and other chlorine containing halocarbons, with high anisotropic corrosion and good selectivity, because “chlorine” only with ion bombardment under the conditions of corrosion rate is fast, and fluorine-containing compounds, due to “fluorine” Of the corrosion does not require ion bombardment, easily isotropic, SF_6 is non-carbon corrosion gas, will not generate polymer, and the silicon corrosion rate faster, and better Si / SiO_2 corrosion selectivity , But many papers reported anisotropic corrosion characteristics of poor. Recently, R. Pinto et al. Studied reactive ion etching of SF_6.