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通常，人们都采用Ａｒ＋刻蚀法轰击样品表面以表征其元素的深度分布和价态。这种分析方法的缺点是容易导致大多数化合物被还原而使表面层的真实组成受到破坏。因此，利用具有非破坏性特点的Ｘ射线光电子谱的角度分辩技术，对ＭｏＳ２粉晶表面几个分子层内的原子浓度分布作了深度剖析和元素氧化状态的表征，以考察其氧化反应机理。结果表明，ＭｏＳ２表面氧化过程很复杂，Ｍｏ４＋经由中间化合态Ｍｏ５＋氧化生成Ｍｏ６＋，Ｍｏ５＋的３ｄ５／２电子结合能随Ｍｏ６＋／Ｍｏ４＋之比值（即氧化程度）不同而变化；ＭｏＳ２的初始氧化发生在表面单分子层，硫原子流失在表面形成了很多活性反应中心，吸附在表面的氧首先在活性点完成氧化反应生成ＭｏＯ３；ＭｏＳ２的表面氧化反应由表及里逐步完成，内层的氧原子比表层的多，可见全部完成按化学计量比的氧化反应要有一个过程。研究结果为深入认识ＭｏＳ２表面氧化状态和过程提供了科学依据。
In general, Ar + etching is used to bombard the sample surface to characterize the depth distribution and valence of its elements. The disadvantage of this method of analysis is that it easily leads to the reduction of most of the compounds and the destruction of the true composition of the surface layer. Therefore, using the angle-resolved technique of non-destructive X-ray photoelectron spectroscopy, the atomic concentration distributions in several molecular layers of MoS2 powder surface were characterized and their oxidation states were investigated to investigate their oxidation mechanism. The results show that the oxidation process of MoS2 is very complicated. Mo4 + is oxidized to Mo6 + via the intermediate chemical state Mo5 +. The 3d5 / 2 electron binding energy of Mo5 + varies with the ratio of Mo6 + to Mo4 +, ie the degree of oxidation. MoS2 initial oxidation occurs on the surface The monolayer and sulfur atoms lost a lot of active reaction centers on the surface. The oxygen adsorbed on the surface first completes the oxidation reaction at the active site to form MoO3. The surface oxidation reaction of MoS2 is completed gradually from the surface to the surface. The oxygen atoms in the inner layer More, we can see that all have to complete a stoichiometric oxidation reaction to have a process. The results provide a scientific basis for understanding the surface oxidation state and process of MoS2.