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文章报道了820离子源在600kV离子注入机上的应用。已经从820离子源引出了20个以上的离子品种应用于半导体、金属和绝缘体的材料改性研究。还讨论了离子束流污染问题。
The article reports the application of 820 ion source on 600kV ion implanter. More than 20 ion species have been extracted from the 820 ion source for material modification studies in semiconductors, metals and insulators. Ion beam contamination issues are also discussed.