ＴＩＴＡＮ离子源是一种新的能够同时产生强金属和气体离子束流的离子源。利 用它我们已经得到了 Ａｌ、Ｔｉ、Ｔａ、Ｃｒ、Ｆｅ、Ｃｏ、Ｎｉ、Ｚｎ、Ｓｎ、Ｙ、Ｃ、Ｓｉ、Ｈｅ、Ｎ、Ａｒ等气 体和金属元素离子束。利用阴极斑真空弧可以获得金属离子，利用气体集中弧放电获得 气体离子，引出电压为 １０～８０ｋＶ，气体和金属离子脉冲流强分别为 ０．２５Ａ 和 ０．５０Ａ， 工作频率为 １０～５０ Ｈｚ，束斑面积 ２００ ｃｍ２。本文并对该离子源的离子注入应用做了介 绍。 The TITAN ion source is a new ion source that produces both a strong metal and a gas ion beam. We use it to obtain the ion beams of gases and metal elements such as Al, Ti, Ta, Cr, Fe, Co, Ni, Zn, Sn, Y, C, Si, He, N, The metal ions can be obtained by using the vacuum arc of the cathode spot, the gas ions can be obtained by the concentrated arc discharge of the gas, the extraction voltage is 10-80kV, the flow intensity of the gas and the metal ions are 0.25A and 0.50A respectively, and the operating frequency is 10-50Hz , Beam spot area of ​​200 cm2. In this paper, the ion source ion implantation applications are introduced.