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物理汽相沉积法是制造光学薄膜的常用技术。需要薄膜的材料在真空中用电子枪或电阻加热使温度达到必要值,以便产生足够的蒸气压,使薄膜材料沉积在基体上。这种沉积方法达到的动能有限,并导致与大块材料性能有一定偏差的柱状膜层结构。新技术,如用离子蒸镀动能较高,膜层结构便有改善,但其致命缺点是生产成本显著增加。此外,激光破坏阈值可能会降低。考虑到各类材料特性和可能利用新材料时,采用传统技术就能符合激光器研制者的大
Physical vapor deposition is a common technique used to make optical films. Thin film materials are heated in vacuum with electron guns or resistance heating to the necessary temperature to produce sufficient vapor pressure to deposit the thin film material on the substrate. This deposition method achieves limited kinetic energy and results in a columnar film structure that deviates from the bulk material properties. New technologies, such as using ion-deposition kinetic energy higher film structure will be improved, but its fatal disadvantage is a significant increase in production costs. In addition, the laser damage threshold may be reduced. Taking into account the characteristics of various types of materials and the possible use of new materials, the use of traditional technologies will be able to meet the large laser developers