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美国卡博特(Cabot)公司最近在日本完成三重县艺能(Geino)工厂的建设,该厂生产高纯抛光用淤浆,应用于半导体生产中的化学机械抛光(CMP)过程.
Cabot Corporation recently completed the construction of the Geino plant in Mie Prefecture, Japan, which produces high-purity polishing slurry for use in chemical mechanical polishing (CMP) processes in semiconductor manufacturing.