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利用SiOxNy 薄膜光学常数随化学计量比连续变化的特性,给出了制备折射率连续可调的SiOxNy 薄膜的实验条件。用磁控反应溅射法制备了不同氮氧比的SiOxNy 薄膜。研究了不同气流比率条件下薄膜光学常数、化学成分及溅射速率等的变化。用UV- VIS光谱仪测试了透射率曲线,利用改进的单纯型法拟合透射率曲线计算得到了折射率和消光系数。测试了红外傅立叶光谱(FTIR)曲线和X光光电子能谱(XPS)分析了薄膜成分的变化。实验表明薄膜特性与N2/O2 流量比率密切相关,通过控制总压和改变气体流量比可控制SiOxNy 薄膜的折射率n从1.92到1.46连续变化,应用Wemple- DiDomenico模型计算出光子带隙在6.5 eV到5 eV之间单调变化。
The experimental conditions for the preparation of SiOxNy films with continuously adjustable refractive index were given by using the properties that the optical constants of SiOxNy films changed continuously with the stoichiometry. SiOxNy thin films with different N / O ratios were prepared by magnetron reactive sputtering. The changes of optical constants, chemical composition and sputtering rate of films under different air flow rates were studied. The transmittance curve was tested by UV-VIS spectrometer. The refractive index and extinction coefficient were calculated by fitting the transmittance curve with simplex method. The changes of film composition were analyzed by Fourier transform infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy (XPS). Experiments show that the film properties are closely related to the N2 / O2 flow rate. The refractive index n of the SiOxNy film can be controlled from 1.92 to 1.46 by controlling the total pressure and changing the gas flow ratio. The Wemple-DiDomenico model is used to calculate the photonic band gap at 6.5 eV Monotonically varying between 5 eV.