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采用真空射频辉光放电技术对喷砂酸蚀工艺处理后的钛表面进行等离子体氧化工艺的优化研究,以用于牙种植体表面改性。以钛表面的接触角作为正交试验的参考指标,对等离子体氧化工艺进行优化。在试验范围内,优化的参数为:工作压力为6.5 Pa,O2/Ar=1(Ar=5 sccm),基板直流偏压为400 V,射频功率为200 W,氧化时间60 min。利用扫描电子显微镜、接触角测量仪及X射线光电子能谱仪研究了优化后的氧化膜对钛表面形貌、亲水性的影响以及其化学组成和价键状态。结果表明:优化工艺处理后,钛片表面保留了原有的多孔形貌,并获得了平均接触角低于10°的超亲水性表面,但随着暴露空气时间的增加,其接触角会增大;钛表面出现Ti4+和Ti3+离子,其中二者的比例基本相同。
A vacuum RF glow discharge technique was used to optimize the plasma oxidation process on the titanium surface after the sandblasting and etching process for surface modification of dental implants. The contact angle of titanium surface was taken as the reference index for orthogonal test to optimize the plasma oxidation process. Under the experimental conditions, the optimized parameters are: working pressure 6.5 Pa, O2 / Ar = 1 (Ar = 5 sccm), substrate DC bias 400 V, RF power 200 W and oxidation time 60 min. The effects of the optimized oxide film on the surface morphology and hydrophilicity of titanium and its chemical composition and valence state were studied by scanning electron microscopy, contact angle measurement and X-ray photoelectron spectroscopy. The results show that the surface of titanium plate retains the original porous morphology and the superhydrophilic surface with average contact angle less than 10 ° is obtained after the optimized process. However, with the exposure time increasing, the contact angle Increase; titanium surface Ti4 + and Ti3 + ions, of which the two are basically the same ratio.