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低温氮化广泛应用于交变应力高、接触载荷低的条件下工作的零件。这种工艺在低于600℃(即低于共析转变温度)的在各种介质(液体介质,气体介质,包括添加有含碳气体的气氛)中进行。不论在何种介质中进行氮化,低温氮化时主要发生氮的扩散,而扩散层的结构决定于 Fe—N 状态图。碳(或氧)参与渗层表面氮化物区的形成过程,并促使形成碳氮化
Low temperature nitriding is widely used in parts with high alternating stress and low contact load. This process is carried out in a variety of media (liquid media, gaseous media, including atmospheres with added carbonaceous gases) below 600 ° C (ie below the eutectoid transformation temperature). Regardless of the medium in which nitridation occurs, nitrogen diffusion occurs predominantly at low temperatures and the structure of the diffusion layer depends on the Fe-N state diagram. Carbon (or oxygen) participates in the formation of nitrides on the surface of the infiltrated layer and promotes the formation of carbonitrides