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介绍了利用逐层生长法(layer by layer)在等离子体化学气相沉积系统中制各纳米硅薄膜。着重介绍制备纳米硅薄膜的沉积过程和生长机制。指出氢基因为制备新技术发展的关键,并且将在今后纳米硅薄膜制备技术发展中起重要作用。
This paper introduces the use of layer by layer deposition in the plasma CVD system to fabricate various nanostructured silicon films. The deposition process and growth mechanism of nanosilica films are emphatically introduced. It is pointed out that the hydrogen gene is the key to the development of new technology and will play an important role in the future development of nanostructured silicon thin films.