论文部分内容阅读
为了研究碳纳米管薄膜的强流脉冲发射特性,采用酞菁铁高温热解方法在机械抛光铜基底上直接生长了碳纳米管薄膜(Cu-CNTs),Cu-CNTs生长方向各异.在20GW脉冲功率源系统中采用二极结构对Cu-CNTs的强流脉冲发射特性进行研究,研究结果表明:在单脉冲发射条件下,随脉冲电场峰值的增大,Cu-CNTs薄膜的发射电流峰值呈线性增加,当宏观场强为15.5V/μm时,发射脉冲电流的峰值可达到5.56kA,对应的发射电流密度0.283kA/cm2,当宏观场强达到32.0V/μm时,发射脉冲电流的峰值可达到18.19kA,对应的发射电流密度0.927kA/cm2,发射电流能力明显优于已有报道.在相同峰值,连续多脉冲情况下,碳纳米管薄膜具有良好的发射可重复性,且发射性能稳定.
In order to study the high-current pulsed emission characteristics of CNTs, Cu-CNTs films were grown directly on the mechanically polished copper substrate by high-temperature pyrolytic phthalocyanine, and the growth directions of Cu-CNTs varied. The pulsed power source system uses a bipolar structure to study the high-current pulse emission characteristics of Cu-CNTs. The results show that the emission current peak of Cu-CNTs films increases with the increase of the pulse electric field under single pulse emission When the macroscopic field intensity is 15.5V / μm, the peak value of the emission pulse current can reach 5.56kA and the corresponding emission current density is 0.283kA / cm2. When the macroscopic field intensity reaches 32.0V / μm, the peak value of the emission pulse current Which can reach 18.19kA, corresponding to the emission current density of 0.927kA / cm2, the emission current capability is significantly better than previously reported in the same peak, continuous multi-pulse, the carbon nanotube film has good emission repeatability, and the emission performance stable.