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本文以汞膜电极于NH_4Cl介质(pH5.0)中,研究了钢铁试剂存在下,痕量铟的差分脉冲吸附溶出伏安行为,并探讨了吸附机理。发现在较负电位下(-1.5V)子富集后,所得阴极溶出峰更敏锐。铟浓度在1.0×10~(-10)～5.0×10~(-7)mol·dm~(-3)间有良好的线性,富集15min,检测限为4.0×10~(-11)mol·dm~(-3)。方法标准偏差及变动系数分别为0.064和8.4％。
In this paper, the differential pulse stripping voltammetry of trace amounts of indium in the presence of steel reagent was studied with mercury membrane electrode in NH4Cl medium (pH5.0), and the adsorption mechanism was discussed. The resulting cathodic dissolution peak was found to be more sharp after sub-enrichment at a more negative potential (-1.5 V). The concentration of indium has a good linearity between 1.0 × 10 -10 ~ 5.0 × 10 -7 mol · dm -3 and is 15 min with the detection limit of 4.0 × 10 ~ (-11) mol · Dm ~ (-3). The method standard deviation and coefficient of variation were 0.064 and 8.4% respectively.