用透射电子显微镜(TEM)和Raman散射(RS)研究了对向靶溅射法制备的Co/C软X射线多层膜在退火条件下碳的结构变化.结果表明,碳层的结构变化可大致分为三个阶段,即有序化,结晶以及晶粒生长阶段。在退火温度低于400℃时的有序化阶段,非晶碳层中键角无序的三配位键和四配位键转变为理想的三配位键。在结晶阶段,非晶碳层在500～600℃的退火温度下结晶成为石墨微晶。在晶粒生长阶段,样品在700℃以上温度退火,石墨微晶尺寸增大,与TEM分析结果相一致。 The structure of carbon under annealing condition was investigated by transmission electron microscopy (TEM) and Raman scattering (RS). The results show that the structure of carbon layer can be changed Generally divided into three stages, namely, the order of crystallization and grain growth stage. In the ordering stage when the annealing temperature is lower than 400 ° C, the uncoordinated tri- and tetra-coordinated bonds in the amorphous carbon layer are converted to the ideal triple-coordinated bonds. During the crystallization stage, the amorphous carbon layer crystallizes into graphite crystallites at an annealing temperature of 500-600 ° C. During the grain growth phase, the sample was annealed at a temperature above 700 ° C and the size of graphite crystallites increased, consistent with the results of TEM analysis.