论文部分内容阅读
为研究薄膜材料在强电场激励下的相变特性,采用直流磁控溅射工艺在硅衬底表面制备厚度不同的二氧化钒薄膜,搭建基于静电高压源和铜质电极夹具的材料相变特性测试系统。通过改变外施电场强度,研究薄膜材料的场致相变特性。结果表明:外施场强达到600 k V/m左右时,材料表现出明显的绝缘态-金属相变(MIT)特性;外施场强达到700k V/m时,材料电导率的变化幅度超过2.6个数量级,且远未达到饱和,随外场继续增加仍有很大上升空间。
In order to study the phase transition characteristics of thin film materials under strong electric field, different thick vanadium dioxide films were prepared on the surface of silicon substrate by direct current magnetron sputtering, and the phase transition characteristics of materials based on electrostatic high voltage source and copper electrode fixture Test system. By changing the applied electric field intensity, the field-induced phase change characteristics of the thin film materials are studied. The results show that the material exhibits obvious MIT characteristics when applied field strength reaches about 600 k V / m. When the applied field strength reaches 700 k V / m, the material conductivity changes more than 2.6 orders of magnitude, and far from reaching saturation, with the field continues to increase there is still much room for growth.