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本文研究了X射线光刻采用的三层结构工艺。X射线光刻胶的性能,目前要比常规光刻胶差很远,特别是灵敏度较高的X射线胶,因此采用三层结构来弥补X射线胶的不足。X射线光刻中采用三层光刻胶后有如下几个特点:1、灵敏度高;2、纵宽比大;3、形貌图是可以控制的;4、干法刻蚀特性好。本文中采用平行板氧等离子刻蚀装置,得到垂直壁与欠切剖的形貌图。本文详细讨论了三层材料选取和搭配原则以及要求。
This paper studies the three-layer structure technology used in X-ray lithography. The performance of X-ray resist is far worse than that of conventional resist, especially the X-ray glue with high sensitivity. Therefore, the three-layer structure is used to make up for the lack of X-ray glue. X-ray lithography uses three layers of photoresist has the following characteristics: 1, high sensitivity; 2, aspect ratio; 3, topography can be controlled; 4, dry etching characteristics. In this paper, parallel plate oxygen plasma etching device, vertical wall and undercut profile. This article discusses in detail the three-tier material selection and matching principles and requirements.