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氯化氢气是三氯氢硅氢还原法生产高纯硅的主要原料之一。其生产方法,国外大多采用氯化氢脱吸工艺,而国内则大多采用直接合成的工艺。氯化氢气的脱吸工艺,其最大优点是独立地连续运行,不受下一工序的影响,同时能获得100%的纯氯化氢气。但是,纯氯化氢气对下一工序生产三氯氢硅来说不是必要的。由于
Hydrogen chloride gas is one of the main raw materials for producing high purity silicon by hydrogen trichlorosilane hydrogen reduction. Its production methods, most of the foreign use of hydrogen chloride desorption process, while most of the domestic direct synthesis process. Hydrogen chloride gas desorption process, the biggest advantage of its independent continuous operation, without the impact of the next process, while 100% pure hydrogen chloride gas can be obtained. However, pure hydrogen chloride gas is not necessary for the production of trichlorosilane in the next process. due to