系统研究了溅射工艺对非晶磁性薄膜的影响,发现在不同的氩气压下,薄膜的磁学性质随负偏压有不同的变化关系。采用电子探针、扫描电子显微镜等测试手段,发现在不同的溅射条件下,非晶膜的微观结构不同。在较高氩气压下,膜中会出现许多圆柱形结构,从而引起膜的软磁性能下降。分析了造成这种结构差别的原因。采用最佳溅射条件,制出了性能优良的非晶态软磁薄膜。 The effect of sputtering process on amorphous magnetic films was systematically studied. It was found that the magnetic properties of the films varied with the negative bias under different argon pressures. Using electron probe, scanning electron microscopy and other testing methods, we found that under different sputtering conditions, the amorphous film microstructure is different. At higher argon pressure, many cylindrical structures appear in the film, causing the soft magnetic properties of the film to decrease. Analyzed the reasons for this structural difference. Using the best sputtering conditions, the excellent performance of the amorphous soft magnetic film was made.