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为了实现高记录密度的磁盘,研究了采用溅射法制成的氧化物薄膜和镀有氧化铝膜的Al 合金板的新式氧化物磁盘介质。(1)氧化物磁性薄膜的制作方法分以下两步。首先在强氧化气氛中,通过反应溅射形成α-Fe_2O_3;然后继续在氢气中进行还原生成Fe_3O_4。(2)采用了与涂布型磁盘板相同的Al 合金基板,由于表面镀有较硬的氧化铝膜,所以与以前基板相比,提高了表面精度及耐磁头磨损性。(3)由于同时添加Al 和Co,提高了磁特性,而且记录密度达到了800位/毫米。(4)今后的研究课题不仅只限于电磁转换特性,而且还要对漏码、耐磁头磨损性等方面进行研究,同时考虑到生产率的问题还要进一步提高磁性膜的生成速度。
In order to realize a high recording density disk, a novel oxide disk medium using an oxide film made by a sputtering method and an Al alloy plate coated with an aluminum oxide film has been studied. (1) The production method of oxide magnetic thin film is divided into the following two steps. First in a strong oxidizing atmosphere, the formation of α-Fe_2O_3 by reactive sputtering; and then continue to reduce the hydrogen generated Fe_3O_4. (2) The same Al alloy substrate as that of the coated disk is used, and since the surface is coated with a hard aluminum oxide film, surface accuracy and head wear resistance are improved as compared with the conventional substrate. (3) Since the addition of Al and Co simultaneously, the magnetic properties are improved and the recording density reaches 800 bits / mm. (4) Future research topics are not only limited to the characteristics of electromagnetic conversion, but also the study of leaky code, wear resistance of magnetic head and the like, and at the same time, the production rate of magnetic film needs to be further improved in consideration of the productivity problem.