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本文系一篇综合性的述评,内容大致分三部分:(一)阐述离子散射和溅射现象的物理过程以及有关主要参数和概念;(二)介绍应用于表面和薄膜分析的三类质谱仪器一离子散射能谱计,二次离子质谱计(包括直接成像质量分析仪、扫描离子微区探针和二次离子表面分析仪),电离中性粒子质谱计一的原理、结构、性能和最新进展,列举了主要参数的对比;(三)讨论散射和溅射方法在表面分析、测绘横向浓度分布和纵深浓度分布方面的应用,并比较了各种方法在定量分析上的应用情况。
This article is a comprehensive review of the contents of roughly divided into three parts: (a) elucidate the physical process of ion scattering and sputtering phenomena and the main parameters and concepts; (b) introduce the application of surface and thin film analysis of three types of mass spectrometry equipment An ion scattering spectrometer, secondary ion mass spectrometer (including direct imaging mass spectrometer, scanning ion microprobe and secondary ion surface analyzer), ionization of the neutral mass spectrometer a principle, structure, performance and the latest (3) Discuss the application of scattering and sputtering methods in surface analysis, horizontal distribution of concentration and depth concentration distribution, and compare the application of various methods in quantitative analysis.