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六硼化镧(LaB6)具有电子逸出功低、高熔点和高化学稳定性等优点,是制作热阴极和场发射阴极的理想发射体材料。而且在常规场发射尖锥表面涂敷一层LaB6薄膜能够大幅度提高场发射尖锥的发射能力。为了测量LaB6薄膜的逸出功,采用电子束蒸发技术沉积LaB6薄膜,并对薄膜进行了X射线衍射分析和X射线光电谱分析。通过测量薄膜的热电子发射特性和敷LaB6薄膜的硅尖锥阵列的场致电子发射特性确定了LaB6薄膜的逸出功,与块状LaB6多晶材料的逸出功大体相同,说明电子束蒸发沉积技术适合于制备高纯度、低逸出功的LaB6薄膜。
LaB6 has the advantages of low electron emission power, high melting point and high chemical stability, and is an ideal emitter material for making hot cathode and field emission cathode. In addition, LaB6 film coated on the surface of conventional field emission cone can greatly enhance the emission of field emission cone. In order to measure the work function of LaB6 thin films, LaB6 thin films were deposited by electron beam evaporation. The films were analyzed by X-ray diffraction and X-ray photoelectron spectroscopy. The work function of the LaB6 thin film was determined by measuring the hot electron emission characteristics of the thin film and the field electron emission characteristics of the silicon pyramidal array of LaB6 thin film. The work function of the LaB6 thin film was approximately the same as that of the bulk LaB6 polycrystalline material. The deposition technique is suitable for preparing LaB6 thin films with high purity and low work function.