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采用脉冲激光沉积技术在不同气氛和氧分压下,在抛光石英片上生长了一系列(200)面择优取向的Nd∶LuVO4薄膜。利用X射线衍射(XRD)分析了所制备薄膜性能,认为成膜较为适宜的气氛为氧气,且氧分压为20Pa时所得到的薄膜性能较好。利用原子力显微镜(AFM)观察了Nd∶LuVO4薄膜的表面形貌,分析了氧分压的存在对薄膜表面质量的影响。利用卢瑟福背散射(RBS)分析了薄膜的组成,发现薄膜的成分组成与靶材的成分较为一致。利用棱镜耦合法测得了该薄膜中每条模所对应的有效折射率为2.0044和1.7098。
A series of (200) preferred oriented Nd:LuVO4 thin films were grown on polished quartz wafers by pulsed laser deposition at different atmospheres and partial pressures of oxygen. The properties of the prepared films were analyzed by X-ray diffraction (XRD). The suitable atmosphere for the film formation was oxygen, and the film obtained at the oxygen partial pressure of 20 Pa showed better performance. The surface morphology of Nd:LuVO4 thin films was observed by atomic force microscopy (AFM), and the effect of oxygen partial pressure on the surface quality of the films was analyzed. The composition of the film was analyzed by Rutherford backscattering (RBS), and the composition of the film was found to be consistent with the composition of the target. The effective refractive index of each mode of the film measured by prism coupling method was 2.0044 and 1.7098.