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采用直流磁控反应溅射法在未加热衬底上沉积TiO2薄膜,以紫外灯为光源进行了薄膜光催化降解亚甲基蓝溶液的实验,研究了沉积工艺参数和后处理退火温度对薄膜光催化性能的影响。结果表明:经过500℃退火、厚度较大的薄膜样品光催化效率较高;膜厚基本相同的样品,沉积时电源功率较小、Ar/O2流量比例较小的薄膜光催化效率较高。
The TiO2 film was deposited on the unheated substrate by direct current magnetron reactive sputtering method. The photocatalytic degradation of methylene blue solution by UV light was studied. The effects of deposition parameters and post-treatment annealing temperature on the photocatalytic performance influences. The results show that the photocatalytic efficiency of the films with larger thickness after annealing at 500 ℃ is higher. The samples with the same film thickness have lower power and the ratio of Ar / O2 is higher.